脉冲偏压对TiAlCN薄膜结构与力学性能的影响Effect of pulse negative bias on microstructure and mechanical property of TiAlCN films
任鑫,窦春岳,齐鹏涛,赵瑞山
摘要(Abstract):
利用多弧离子镀-磁控溅射复合技术通过改变脉冲偏压在Si片与SS304基体表面制备了TiAlCN薄膜,研究了不同脉冲偏压对薄膜结构和力学性能的影响。薄膜成分、表面形貌、相结构及力学性能分别利用能量弥散X射线谱(EDS)、扫描电镜(SEM)、X射线衍射(XRD)和纳米压痕仪等设备进行表征。结果表明,随着脉冲负偏压的增加,薄膜中Ti元素的含量先减小后增大,而Al元素有相反的变化趋势。适当增大脉冲偏压,薄膜表面颗粒、凹坑等缺陷得到明显改善。物相分析表明TiAlCN薄膜主要由(Ti,Al)(C,N)相,Ti_4N_(3-)_x相和Ti_3Al相组成。薄膜平均硬度与弹性模量随脉冲负偏压的增加先增大后减小,在负偏压-200 V时达到最大值分别为36.8 GPa和410 GPa。
关键词(KeyWords): TiAlCN薄膜;复合离子镀;脉冲偏压;结构;力学性能
基金项目(Foundation): 辽宁省教育厅科学技术研究资助项目(LJYL007)
作者(Author): 任鑫,窦春岳,齐鹏涛,赵瑞山
DOI: 10.13289/j.issn.1009-6264.2019-0410
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